Saffih, F. Et Al. 2014. Fabrication of silicon nanostructures with large taper angle by reactive ion etching. Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics , vol.32, no.6 .

Saffih, F., Con, C., Alshammari, A., Yavuz, M., & Cui, B., (2014). Fabrication of silicon nanostructures with large taper angle by reactive ion etching. Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics , vol.32, no.6.

Saffih, FAYCAL Et Al. "Fabrication of silicon nanostructures with large taper angle by reactive ion etching," Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics , vol.32, no.6, 2014

Saffih, FAYCAL Et Al. "Fabrication of silicon nanostructures with large taper angle by reactive ion etching." Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics , vol.32, no.6, 2014

Saffih, F. Et Al. (2014) . "Fabrication of silicon nanostructures with large taper angle by reactive ion etching." Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics , vol.32, no.6.

@article{article, author={FAYCAL SAFFIH Et Al. }, title={Fabrication of silicon nanostructures with large taper angle by reactive ion etching}, journal={Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics}, year=2014}