Ayari-Kanoun, A. Et Al. 2016. Silicon nanostructures with very large negatively tapered profile by inductively coupled plasma-RIE. Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics , vol.34, no.6 .

Ayari-Kanoun, A., Aydinoglu, F., Cui, B., & Saffih, F., (2016). Silicon nanostructures with very large negatively tapered profile by inductively coupled plasma-RIE. Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics , vol.34, no.6.

Ayari-Kanoun, Asma Et Al. "Silicon nanostructures with very large negatively tapered profile by inductively coupled plasma-RIE," Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics , vol.34, no.6, 2016

Ayari-Kanoun, Asma Et Al. "Silicon nanostructures with very large negatively tapered profile by inductively coupled plasma-RIE." Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics , vol.34, no.6, 2016

Ayari-Kanoun, A. Et Al. (2016) . "Silicon nanostructures with very large negatively tapered profile by inductively coupled plasma-RIE." Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics , vol.34, no.6.

@article{article, author={Asma Ayari-Kanoun Et Al. }, title={Silicon nanostructures with very large negatively tapered profile by inductively coupled plasma-RIE}, journal={Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics}, year=2016}