Transport of carriers in metal/porous silicon/c-Si device structures based on oxidized porous silicon


Balagurov L., Bayliss S., Kasatochkin V., Petrova E., Unal B., Yarkin D.

Journal of Applied Physics, vol.90, no.9, pp.4543-4548, 2001 (SCI-Expanded) identifier

  • Publication Type: Article / Article
  • Volume: 90 Issue: 9
  • Publication Date: 2001
  • Doi Number: 10.1063/1.1407845
  • Journal Name: Journal of Applied Physics
  • Journal Indexes: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Page Numbers: pp.4543-4548
  • Istanbul Gelisim University Affiliated: No

Abstract

Current-voltage (I-V) and impedance measurements of oxidized metal/porous silicon (PS)/c-Si sandwich structures were performed at various temperatures. The I-V dependence at relatively small bias was found to be determined by the resistance of the PS layer. When the reverse bias is increased the injection of carriers commences. A power-law space charge limited current in the I-V dependence was observed at high forward bias. An exponential energy distribution of localized states with a characteristic energy of 60 meV was calculated from these. The existence of an inversion (n-type) layer with high conductivity was established in the p-type c-Si substrate adjacent to the PS layer. The presence of this inversion layer leads to an increase of the active device area, capacitance, and reverse current. © 2001 American Institute of Physics.