Formation of porous silicon layers on insulating substrate for microbridge - Type sensor applications
Semiconductor Materials for Sensing, Boston, MA, Amerika Birleşik Devletleri, 29 Kasım - 02 Aralık 2004, cilt.828, ss.229-234, (Tam Metin Bildiri)
- Yayın Türü: Bildiri / Tam Metin Bildiri
- Cilt numarası: 828
- Basıldığı Şehir: Boston, MA
- Basıldığı Ülke: Amerika Birleşik Devletleri
- Sayfa Sayıları: ss.229-234
- İstanbul Gelişim Üniversitesi Adresli: Hayır
Özet
Formation processes of porous silicon on insulating substrate were studied. It was demonstrated that both electrochemical and chemical formation methods allow to transform heavily doped p-type polycrystalline silicon into homogeneous porous silicon. Porous silicon was successfully used as sacrificial layer in the fabrication process of microbridge structures. © 2005 Materials Research Society.