Semiconductor Materials for Sensing, Boston, MA, United States Of America, 29 November - 02 December 2004, vol.828, pp.229-234
Formation processes of porous silicon on insulating substrate were studied. It was demonstrated that both electrochemical and chemical formation methods allow to transform heavily doped p-type polycrystalline silicon into homogeneous porous silicon. Porous silicon was successfully used as sacrificial layer in the fabrication process of microbridge structures. © 2005 Materials Research Society.