Semiconductor Materials for Sensing, Boston, MA, Amerika Birleşik Devletleri, 29 Kasım - 02 Aralık 2004, cilt.828, ss.229-234
Formation processes of porous silicon on insulating substrate were studied. It was demonstrated that both electrochemical and chemical formation methods allow to transform heavily doped p-type polycrystalline silicon into homogeneous porous silicon. Porous silicon was successfully used as sacrificial layer in the fabrication process of microbridge structures. © 2005 Materials Research Society.